Art and Architecture Student Work Featured in Juried Art Show in New York City
Work by Lucy Plowe (B.F.A. '20) and Sean Steed (B.Arch. '18) was selected for the juried group show titled Multilayered, opening on June 26 at International Print Center New York (IPCNY).
Featuring work by more than 40 artists, the show is the 58th presentation of International IPCNY's New Prints Program, a biannual, juried exhibition for prints and print-based work created in the preceding 12 months. Multilayered was curated by Juan Sánchez, an artist of the Nuyorican cultural movement. As a multimedia artist with an activist stance, Sánchez draws on symbols, images, and texts from popular and traditional culture to explore questions of ethnic and national identity.
According to the IPCNY's press release, the 43 prints and print-based works on view in Multilayered reflect Sánchez’s interest in "new narratives for an increasingly hybridized cultural world. Many of the artists skillfully deploy traditional printmaking techniques including lithography, etching, woodcut, and screen prints to create enigmatic characters and complex scenes, while others use prints as the basis for expansive installations."
Created for The Hybrid Print, Associate Professor Greg Page's 2018 advanced printmaking class, Plowe's work includes two lithography prints. Titled Fear No Fate, each of the two prints is 20" x 36" on Thai paper.
Steed's work, Tomorrow is looking great / Some things never change, is a series of 12, 31" x 42" silkscreen monotypes that provide a commentary on contemporary political campaigns. Created for Associate Professor Elisabeth Meyer's fall 2017 class Painting to Print: Monotype, Steed's posters contain phrases from political slogans or speeches and nationalist rhymes and comment on the idea of national flags and identity.
Multilayered is on display at IPCNY until September 22. A reception and talks by the artists will be held on Thursday, June 28, from 6 to 8 p.m.